According to reports from foreign media, Chinese scientists built a prototype extreme ultraviolet (EUV) lithography machine earlier this year in a Shenzhen laboratory, which is currently in the testing phase. The machine is large enough to almost fill an entire factory floor and is capable of producing chips that power artificial intelligence (AI), smartphones, and advanced weaponry.
The report notes that this project, described as "China's Manhattan Project," highlights China's determination to rival the West in the field of AI chip technology. The so-called "Manhattan Project" refers to the secret wartime program by the United States to develop the atomic bomb.
Built by Former ASML Engineer Team
The report also states that this EUV lithography machine was developed by a team of former engineers from the Dutch chip equipment manufacturer ASML, who conducted reverse engineering on ASML's EUV lithography technology. At present, the Chinese EUV lithography machine is operational and has successfully generated extreme ultraviolet light, but has yet to produce usable chips. The Chinese government's goal is to achieve prototype chip production before 2028, but people involved in the project indicate that mass production may not be possible until 2030.